Former Hewlett-Packard President and CEO John A. Young Joins Nanosys Board of Directors

Palo Alto, CA - (April 1, 2004). Nanosys, Inc., a developer of nanotechnology-enabled solutions, has added John A. Young to the company’s board of directors. From 1978 to 1992, Mr. Young was President and Chief Executive Officer of Hewlett-Packard Company, one of the world’s leading technology solutions provider to consumers, businesses and institutions globally in areas spanning IT infrastructure, personal computing and access devices, global services, imaging services and printing.

About Nanosys

Based in Palo Alto, California, Nanosys works with strategic collaborators such as Intel, DuPont, Matsushita Electric Works and SAIC to develop nanotechnology-enabled components for products in information technology, communications, renewable energy, defense and the life and physical sciences.

About John Young

Mr. Young joined Hewlett-Packard in 1958, and served as President and CEO from 1978 to 1992. He serves on the Board of Directors of Affymetrix, Fluidigm, ChevronTexaco, Lucent Technologies and is Chairman of Ciphergen Biosystems, Inc. Under President Reagan, Mr. Young served as Chairman of the President’s Commission on Industrial Competitiveness, which was chartered to explore means of improving the competitive posture of US industry. He was the founding chairman of the Council on Competitiveness, a private-sector group established to continue the goal of improving US competitiveness. Under President Clinton, he served as Co-Chairman of the President’s Committee of Advisors on Science and Technology (PCAST) for 8 years. Mr. Young has received numerous honors and recognitions, including the Electronic Business Magazine and Research and Development Magazine’s Executive of the Year, the National Science Foundation’s Distinguished Public Service Award, the American Electronics Association’s Medal of Achievement and the Prime Minister’s Trade Award from the Prime Minister of Japan. He is also a member of the National Academy of Engineering.